Photochemical etching is an ideal process for grids, screens, meshes, filters, separators and other perforated metal applications. The etching process produces consistent, burr-free holes as small as .004Ħħ in .002Ħħ thick material. As a general rule, minimum hole size is 110% of the thickness of the material, e.g. on .010Ħħ material, the smallest hole would be .011.Ħħ The etching process also produces all kinds of one-side pattern.